JA EN

PRODUCT

04Thick Film Resist Coatings

In recent years, the application of photoresist coatings has expanded beyond photomasks.
The limits of miniaturization through conventional cutting and etching for mold formation are becoming apparent, so there are growing demands for optical design through lithography as an alternative. In that context, we have further improved our long-developed spin coating technologies, making it possible to apply thick film coatings ranging from several to 60 μm.
These thick film coatings are also used as protective films for dust prevention while cutting and processing wafers and other materials, in addition to creating molds with fine surface treatments, such as multifunctional films and microlens arrays.

  • Thick Film Resist Coatings

Thick Film Mask Blanks

    • Thick Film Mask Blanks

    The limits of miniaturization through conventional cutting and etching for mold formation are becoming apparent, so there are growing demands for optical design through lithography as an alternative.

Optical Design Through Lithography

    • Optical Design Through Lithography

Protective Coatings for Dustproofing

    • Protective Coatings for Dustproofing

    These films can also be used as protection against dust during downsizing of wafers, etc.
    Since they are resists, they can be easily removed after processing with no effects on the base material.

Lineup Specifications

  • Resist Lineup

    We can propose resists suited to the target film thickness.
    ・AZ P1350/AZ1500
    ・AZ P4000 Series
    ・AZ MIR-700 series
    ※Please contact us regarding coatings for customer-provided resists.

  • Resist Specifications

    ・Thickness: We have provided thicknesses of 1.5–60 μm.
    ・Uniformity: We can achieve a thickness range of ±10% within the effective area.
    ・Within-surface measurements: Non-contact product measurements from small to large sizes are possible.
    ※Effective areas vary depending on the substrate size and resist film thickness.

  • A Wide Range of Sputtering Films

    We can also provide halation-prevention films suited to the wavelength of your specified light source.
    ・Baseline wavelength: 365 nm (film side/glass side)
    ・Baseline wavelength: 436 nm (film side/glass side)
    ・Baseline wavelength: 600 nm (film side/glass side)

  • Supported Board Sizes

    As with normal mask blanks, we can provide soda glass, synthetic quartz, non-alkali, and other materials.
    Small: 2.5–7"
    Medium: 8–26"
    Large: 520 × 800 mm to 800 × 960 mm

Click here for product inquiries

OTHER PRODUCTS